AT810 8 inch Thermal ALD

ALD, Atomic Layer Deposition Systems

Home > Products > 진공증착장비 (Vacuum Deposition System) > ALD Atomic Layer Deposition System > Anric ALD Equipment

Small Footprint Desktop System
Semiconductor-grade metal sealed lines and high temperature compatible fast pulsing ALD valves.
Ultrafast MFC for integrated inert gas purge.
8″ circular chuck customizable for smaller sizes or other shapes.
3 organometallic precursors and 2 (up to 3) counter reactants.
Heated lines throughout (from precursor to chamber).
All aluminum (semiconductor grade) chamber ‒ range up to 300°C
7” touchscreen PLC controller (no PC required).

AT200M, 2" Thermal ALD AT 200M – The Most Cost Effective ALD System on the Market Anric Technologies introduces the smalle

0 393

AT650P 6" Plasma ALD Cost effective, Desktop Plasma ALD Plasma ALD at the cost of a thermal system Small Footprint (38.1

0 386

AT650T 6" Thermal ALD (upgradeable to Plasma) Cost-effective, Desktop Thermal ALD (With in-field upgradeability to Plasma) Small Footprint (38.1 c

0 380

AT410 4 inch Thermal ALD The AT410 is the most cost-effective thermal ALD tool on the market. Small Footprint Desktop System

0 431

AT810 8 inch Thermal ALD The AT810 is the most cost-effective thermal ALD tool on the market. Small Footprint Desktop System

0 355

AT610 6 inch Thermal ALD The AT610 is the most cost-effective 6″ thermal ALD tool on the market. Small Footprint Desktop Syst

0 371

AT-OZONE Generator The ATOzone (Ozone Generator) system utilizes high quality components that deliver high concentratio

0 389