THE SC-1

The first compact cluster system for R&D

The SC-1 is our flagship deposition system that enables to research and develop the materials of the future. It features an innovative patent-pending cluster-design to create a compact, modular and fully automated multi-deposition equipment:

• Capable of performing both Atomic Layer Deposition (ALD) and Physical Vapor Deposition (PVD) without breaking the vacuum to fabricate films with hundreds of multinanolayers.
• No need for mechanical arms or antechambers; which significantly slow down the process, increase the complexity, lab space required and the investment costs.
• Modular and flexible system that allows to easily adapt new hardware and incorporate to our software.

MATERIALS FACTORY

With the benefits of both ALD and PVD

Multinanolayered Materials

Hundreds of multinanolayers of multiple material systems from the PVD and ALD materials library can be fabricated. The combination of ALD and PVD layers creates unique microstructures and properties to fit in your desired application.

Combinatorial Approach

The ALD-PVD microstructure can be further tailored with different film thicknesses along the cross-section and with different deposition temperatures throughout your substrate and process using our temperature gradient stage (TGS).

MODULAR

Customizable and Upgradable

Expandable

The ALD and PVD chambers in the SC-1 can be acquired and operated individually and then be upgraded to a cluster system. New hardware components or in-situ metrology equipment can be added and incorporated to our software and recipe creator.

Compact

By reducing the need of antechambers and mechanical arms, we reduce the complexity and lab space required.

FAST

Accelerating R & D

Automated

The system is fully automated; all the devices and components are connected to our easy-to use software. Hundreds of multinanolayers with both ALD and PVD can be fabricated with the push of a button.

Smart R&D

The temperature gradient stage (TGS) allows to screen a large temperature window to scan precursors, growth rates, microstuructures, chemical compositions, mechanical behaviour and more in a single deposition.

User-Friendly

Plug-and-Play functionality for beginner and advanced users.

Recipe Creator

With our easy-to use recipe creator, complex recipes can be made easy in order to fabricate hundreds of multinanolayers with different parameters in both ALD and PVD process during the deposition.

Low-Maintenance

The easy attachable/detachable panels makes this equipment extremely easy to replace, clean and service the parts.

HARDWARE

Substrate Sizes

• 4 inch wafers
• 6 inch wafers
• Different substrate holders available

Temperatures

• Up to 400 °C
• A gradient of 30 °C to 500 °C using our Temperature Gradient Stage

ALD Precursor Lines

• Up to 12 precursors with individual inlets - bottles and bubblers

Magnetrons

• Up to 4 magnetrons with 3 in. targets

Dimensions

• L x W x H (1250 mm x 600 mm x 1210 mm)

Add-ons

• Microwave plasma sources (PE-ALD)
• In-situ wafer stress measurements
• Customized ports and flanges

ALD-PVD Materials

• Al2O3, TiO2, ZnO, Y2O3, ZrO2, HfO2, Cu, Al, Ti, and more...

ELECTRONICS & SOFTWARE

Mass Flow Controllers

• 4 Analog MFC
• 60 Digital MFC

Pneumatic (ALD) valves

• 24 valves

Pressure Sensors

• 4 Analog

Gate valves

• 3 gate valves with feedback

Flow meters

• 4 Flow meters

Temperature

• 16 Channel PID regulation with K-Type sensors
• 4 PT100/PT1000

Interlocks

• 8 Interlock in
• 12 Interlock out

Additional Connections

• 2 Ethernet
• 2 RS485

The TGS is an off-the-shelf substrate holder that is able to create a temperature gradient from 500 °C  to 30 °C, besides providing homogeneous temperature of up to 400 °C. The temperature gradient can be tailored to different temperature windows.

This allows the screening of new materials and processes to be done in a substantially lower number of experiments. This saves a significant amount of time in the synthesis and characterization.

The TGS can easily be operated with our manual control and recipe creator to increase or decrease the temperature at any point during the process.

Mass Flow Controllers

• 4 Analog MFC
• 60 Digital MFC

Pneumatic (ALD) valves

• 24 valves

Pressure Sensors

• 4 Analog

Gate valves

• 3 gate valves with feedback

Flow meters

• 4 Flow meters

Temperature

• 16 Channel PID regulation with K-Type sensors
• 4 PT100/PT1000

Interlocks

• 8 Interlock in
• 12 Interlock out

Additional Connections

• 2 Ethernet
• 2 RS485

We incorporate microwave plasma sources and generators from SAIREM ❯. The self-matching plasma sources working with 2,45 GHz solid state generators are ideal for ALD and PVD processes:

・ Surface pre-treatment and cleaning

・ Microwave Plasma-Enhanced Atomic Layer Deposition (PE-ALD)

・ Microwave Plasma Assisted Reactive Sputtering (MP-ARS)

• Analysis of your demands and requirements
• Proof-of-concept coatings
• CFD and temperature simulations for homogeneously coating your particular 2D and 3D objects
• Definition of the concept

Design of hardware and software with our concepts aimed to:

• Reduce overall process times : Loading, Heat up, coating process, cool down, etc.
• A homogeneous coating process
• A user-friendly experience
• A clear line of communication to address your goals

• Fabrication and assembly
• Testing of the system
• Process development and optimization of times
• Materials characterization

• Delivery of system
• Training on site
• Assistance and follow-up on your progress

The SC-1 is an innovative patent-pending cluster system:

• Atomic Layer Deposition (ALD) and Physical Vapor Deposition (PVD)
• No need for mechanical arms or antechambers
• Modular, flexible and customizable system