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MBE, Molecular Beam Epitaxy System

Dr. Eberl MBE-Komponenten GmbH, Germany

Effusion Cells

Effusion Cells

 

WEZ, Standard Effusion Cell

WEZ 40-10-22-KS Standard Effusion Cell with integrated cooling shroud and shutter on DN40CF (O.D. 2.75") flange, with 10 cm³ PBN crucible
  • Applicable in most UHV systems up to 1400°C
  • Compatible with all standard MBE crucibles
  • Crucible capacities from 2 to 200 cm³
  • Most effective heating system with excellent reliability and long lifetime
  • Hot lip, cold lip and dual filament designs
  • Optional on-flange integrated cooling shroud and shutter

Data Sheet

 

PEZ, Production Effusion Cell

PEZ 63-130-54 Production Effusion Cell on DN63CF (O.D. 4.5'') flange
  • Compatible with standard MBE systems, e.g. from Varian, EPI, Veeco, VG, or Riber
  • Crucible capacities 40-1700 cm³
  • Precise run-to-run flux reproducibility
  • Customized beam shaping crucible inserts available
  • Excellent reliability and long lifetime
  • Hot lip, cold lip and dual filament designs
  • Optional integrated cooling shroud

Data Sheet

 

NTEZ, Low Temperature Effusion Cell

NTEZ 40-2-16-S-SF Low Temperature Effusion Cell with rotary shutter on DN40CF (O.D. 2.75") flange, 2 cm³ crucible and standard filament

 
  • Applicable in most UHV systems
  • Evaporation of metals, compounds and organic materials between 80°C and 1000°C
  • Crucible capacities from 2 to 200 cm³
  • Robust, reliable tantalum wire heating system
  • Excellent temperature stability and controllability
  • Optional on-flange integrated cooling shroud and shutter

Data Sheet

TCC, Thermal Cracker Cell

TCC 40-130-54-KS with integrated cooling shroud and shutter on DN40CF (O.D. 2.75") flange with 130 cm³ crucible

 
  • Full PBN solution for corrosive materials like Te, Sb, Se, As, Mg
  • DN40CF (O.D. 2.75" ) mounting flange compatible with all MBE systems
  • Thermal cracking up to 1300°C 
  • 35 cm3 or 130 cm3 PBN crucible
  • Excellent thermal isolation between low temperature reservoir and hot cracking zone
  • Integrated water cooling for cracker stage
  • Integrated rotary shutter

Data Sheet

OME, Organic Material Effusion Cell

OME 40-2-25-S Organic Material Effusion Cell on DN40CF (O.D. 2.75") flange with 2 cm³ quartz crucible and integrated shutter

 
  • Patented Thermal Conduction Cooling (TCC)
  • Ideal for evaporation of sensitive organic materials in UHV and OLED applications
  • Temperature range 15-300°C
  • Fast and precise temperature control < ±0.02K with excellent temperature stability
  • Crucibles capacities 2 cm³, 10 cm³ and 35 cm³
  • Full UHV and MBE compatibility

Data Sheet

OREZ, Oxygen Resistant Effusion Cell

OREZ 63-35-37-KS Oxygen Resistant Effusion Cell with integrated cooling shroud and shutter on DN63CF (O.D. 4.5”) flange, with 35 cm³ crucible

 
  • Oxygen resistance option available for most wire heater effusion cells
  • Applicable in oxide MBE systems with chamber pressures up to several mbar
  • Nickel alloy wire heaters up to 1000°C
  • Noble metal alloy wire heaters up to 1200°C
  • Ultimate oxygen resistance by use of platinum shielding
  • Optional on-flange integrated cooling shroud and shutter 

HTEZ, High Temperature Effusion Cell

HTEZ 40-10-32 High Temperature Effusion Cell on DN40CF (O.D.2.75") flange, with 10 cm³ BeO crucible

 
  • Compatible with most MBE systems
  • Various crucible sizes and materials;
  • crucible capacities 1.5, 10, and 35 cm³
  • Self-supporting tungsten wire heater
  • Clean operation in UHV up to 1900°C
  • High reliability and long lifetime
  • Cell option with integrated cooling shroud and shutter

Data Sheet

HTEZ-W, High Temperature Effusion Cell

HTEZ-W 40-10-32 High Temperature Effusion Cell on DN40CF (O.D.2.75") flange

 
  • Compatible with most MBE systems
  • Various crucible materials; crucible capacity 10 cm³
  • No ceramic insulation parts in hot area
  • Free-standing thick tungsten wire filament
  • Clean operation in UHV up to 2000°C
  • High reliability and long lifetime
  • Water cooled current contacts

Data Sheet

 

HTS, High Temperature Source

HTS -W 63 High Temperature Source on DN63CF (O.D. 4.5") flange with cooling shroud and shutter

 
  • Clean operation in UHV up to 2000°C
  • Excellent beam uniformity for doping and layer growth applications
  • Flat pyrolytic graphite or tungsten wire filaments
  • Wide opening crucibles with capacities from 5 to 200 cm³
  • Various crucible materials
  • No ceramic parts in the hot zone

 

DECO, GaP Decomposition Source

DECO 63-150-60-K GaP Decomposition Source for phosphorus on DN63CF (O.D. 4.5") flange, with 150 cm³ PBN crucible and Ga-trapping PBN cap

 
  • High-purity phosphorus (P2) source
  • Simple and safe operation with non-inflammable GaP source material
  • Compatible with most UHV and MBE systems
  • Various crucibles from 10 to 420 cm³
  • Precise and fast flux control with high reliability
  • Optional on-flange integrated cooling shroud and shutter

Data Sheet

SUSI, Silicon Sublimation Source

SUSI 63 Silicon Sublimation Source on DN63CF (O.D. 4.5") flange

 
  • Thermal sublimation of silicon from high purity intrinsic or highly doped Si filament
  • Excellent growth of thin silicon layers
  • Compatible with most MBE systems
  • Water-cooled electrical contacts
  • Inner filament shielding with pure silicon parts
  • No ceramic parts in the hot zone

Data Sheet

SUKO, Carbon Sublimation Source

SUKO 40 Carbon Sublimation Source on DN40CF (O.D. 2.75") flange

 
  • Thermal sublimation of carbon from high purity graphite filament
  • Excellent growth of thin carbon films or Si-C alloys
  • Compatible with most MBE systems
  • Water-cooled electrical contacts
  • Inner filament shielding with pure pyrolytic graphite parts
  • No ceramic or metal parts in the hot zone

Data Sheet

SUKO-A, Atomic Carbon Sublimation Source

SUKO-A 40 Atomic Carbon Sublimation Source on DN40CF (O.D. 2.75") flange

 
  • Thermal sublimation of atomic carbon
  • Refractory metal tube filament filled with ultrapure carbon
  • Only pyrolytic graphite and tantalum parts in hot area
  • Water-cooled power feedthrough
  • Cooling shroud and shutter optionally available
  • Compatible with UHV analysis systems and MBE growth chambers

Data Sheet

 

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