- Compact plate for Ellipsometry applications
- 70° incident & emergent light angles
- -190°C to 400°C with liquid nitrogen cooling option
- 28 mm × 30 mm sample area
- Vacuum-tight chamber
Description
HCP421V-ELP vacuum tight plate는 열과 분위기 제어가 모두 중요한 ellipsometry 애플리케이션으로 설계되었습니다. Silver heating과 cooling block을 사용하는 이 플레이트는 정밀한 온도 균일성을 갖는 넓은 온도 범위를 제공합니다. 이 vacuum-tight 구성은 수분과 산소로부터 민감한 샘플을 보호하고 동결 건조와 같은 진공 공정 연구 시 낮은 압력으로 가스 퍼지 및 배기가 가능합니다.
Thermal Features
Temperature Control |
mK2000 with programmable precision switching PID method |
Thermal Block |
Silver |
Sample Thermal Cover |
Optional removable Inner sample cover with additional window |
Temperature Minimum |
-190°C (with optional liquid N2 cooling) |
Temperature Maximum |
400°C |
Temperature Sensor |
100 Ω Platinum RTD |
Maximum Heating Rate |
+150°C per minute at 100°C |
Maximum Cooling Rate |
-50°C per minute at 100°C |
Minimum Heating and Cooling Rate |
±0.01°C per minute |
Temperature Resolution |
0.01°C |
Temperature Stability |
±0.05°C (above 25°C), ±0.1°C (below 25°C) |
Power supply |
Universal power input |
Software |
Windows compatible software to record and export temperature-time data; remotely control system via VCP connection (Virtual Comm Port) |
Optical Features
Optical access |
Reflection only |
Optical windows |
Removable and exchangeable windows permit full-spectrum transparency |
Minimum Objective Working Distance |
13.2 mm |
Top Window |
Ø27 mm |
Incident light angle |
70.0° from normal |
Emergent light angle |
70.0° from normal |
Window Defrost |
Integrated external window defrost |
Structural Features
Sample Area |
28 mm x 30 mm |
Chamber Height |
4.3 mm |
Atmosphere Control |
Vacuum-tight chamber |
Frame Cooling |
Integrated frame cooling with optional chiller system |
Mounting |
Horizontal capability |
Frame Dimensions |
97 mm x 84 mm x 36.5 mm |
Weight |
600 g |





where both thermal and atmospheric control is critical. Using a silver heating
and cooling block, this plate provides a wide temperature range with precise
thermal uniformity. This vacuum-tight configuration can be both gas purged and
evacuated to low pressures to protect sensitive samples from moisture and
oxygen as well as to study vacuum processes such as freeze drying.
