Speedflo
증착 속도와 코팅 특성, 공정 신뢰성을 향상시키는 고급 반응성 피드백 제어 시스템인 Speedflo와 함께 반응 공정을 완벽하게 구현하세요. Speedflo는 실제 공정의 요구 사항을 기반으로 설계되었으며, 수백 대 이상 산업용 플라즈마 기반의 증착 장비에 공급되어 다양한 요구 사항을 만족함으로써 이미 Speedflo의 성능이 검증되었습니다.
Perfect your process
Speedflo는 8개 채널을 제공하는 Speedflo와 3개 채널을 제공하는 Speedflo Mini의 두 가지 옵션을 제공하며, 마그네트론 스퍼터링에서 PE-CVD 증착까지 광범위한 반응성 공정에 베네핏을 제공하는 호환성을 갖추고 있습니다.
Speedflo auto-tune
Speedflo를 사용하면 사용자 시스템을 빠르고 성능이 높은 제어가 가능합니다. 특허받은 최첨단 자동 컨트롤러 튜닝 과정. 버튼 클릭 한 번으로 프로세스에 맞는 최적의 컨트롤러 파라미터를 제공합니다. 이 자동 튜닝 공정은 빠르고 효과적이며 어떤 장비와 센서의 조합에서도 구현 가능합니다.
시스템을 통합적으로 교정하고 인식 절차를 마친 후, 자동 튜너는 고급 역 동역학 알고리즘(inverse dynamics algorithm)을 사용하여 수집된 데이터를 분석하고 프로세스에 맞는 최적의 컨트롤러 파라미터를 즉시 생성합니다.
모든 절차는 단지 몇 분 정도 소요되며 실제 프로세스의 요구 사항에 완벽하게 맞습니다.
Support & Technology
Gencoa can provide remote or on-site assistance to help optimize your processes, with local support available in UK, USA, Germany, China and Taiwan. The level of support and process know-how complements Gencoa’s complete reactive gas and process control set-up that includes magnetrons, gas bars, and controllers.
Gencoa는 영국, 미국, 독일, 한국 등 원격 또는 현장 지원을 통해 프로세스의 최적화를 돕고, Gencoa의 탁월한 지원과 프로세스 노하우는 마그네트론, 가스 바 (gas bar), 컨트롤러를 포함한 완벽한 반응성 가스 및 프로세스 제어 시스템을 지원합니다.
Sensors
Speedflo와 Speedflo Mini는 각각 사용 가능한 센서 선택 시 센서 옵션을 조합하여 구성할 수 있습니다:
• 목표 전압 (HiPIMS 옵션 가능)
• PEM in-situ (HiPIMS 옵션 가능)
• Spectrometer (Speedflo 용, Speedflo Mini 불가)
• PEM ex-situ (Penning)
• Lambda (O² 전용)
Speedflo Simulator
Speedflo 유저 인터페이스는 Speedflo 시스템의 동적 시뮬레이션을 제공하는 툴을 이용합니다. Gencoa의 공정 제어에 대한 심층적인 이해를 바탕으로, 이 소프트웨어는 가스 공급 파이프 길이와 같은 시스템 특성뿐만 아니라 controller gain 및 calibration paramter와 같은 Speedflo 기능의 효과까지 시뮬레이션합니다.
이 시뮬레이터는 매우 효과적인 도구로, 시스템 사용자가 피드백 제어 및 Speedflo 시스템 작동에 대한 이해를 높일 수 있도록 도와줍니다.
Speedflo Configuration
With two versions of base unit and a wide choice of sensor options available, Speedflo can be configured to perfectly suit many industrial processes.
Hardware options
The Speedflo controller is available in two options to suit different requirements: Speedflo, which has 8 sensor inputs and 8 MFC actuator outputs; and Speedflo Mini, which has 2 sensor inputs and 3 MFC actuator outputs.
The two controllers have identical algorithms and control software, but differ in the number of available inputs and outputs. Both controllers have ethernet connectivity for straightforward communication with the software interface.
Sensor options
Speedflo comes with a number of sensor options, available in a wide range of configurations.
Plasma Emission Monitoring (P.E.M)
The visible light from the plasma contains information of all the species present via the optical emission spectrum. To monitor the intensity of any element in the plasma, a narrow band-pass filter can be used to allow through only the wavelength of light of the material or gas of interest.
P.E.M CCD
The plasma light can be captured by a CCD-type spectrometer which provides a universal picture of the process. For control purposes, the wavelengths of interest are electronically filtered and input to the controller. This type of tool delivers more information, however the integration time of the spectrometer slows down the feedback speed compared to the conventional band-pass P.E.M method.
Remote P.E.M (Penning P.E.M)
Gencoa’s Penning P.E.M sensor enables remote monitoring of plasma emission levels, and is ideal if substrate interference is problematic with conventional P.E.M sensors. A small plasma is generated remotely in the Penning gaugehead. A conventional P.E.M sensor can then be used to measure light intensity at a wavelength of interest. This represents the excess gas from the process.
Lambda
The Lambda sensor is an oxygen probe which provides a direct signal of the oxygen concentrations present in the vacuum. The Gencoa Lambda sensor provides a robust signal with good response speeds. Like P.E.M, it can provide information from multiple monitoring zones down the target length.
Target voltage
A convenient sensor from the process is the target voltage output from the magnetron power supply. This can be used for some material combinations as a stand-alone signal or in addition to a secondary signal such as P.E.M. Successful materials for this type of sensor are silicon and aluminium oxides and nitrides.
HiPIMS
Gencoa has developed sensor technology that enables the control of reactive HiPIMS processes for reproducible depositions and stable system performance.
Speedflo - Reactive Feedback Control System
Speedflo's technology is continuously being developed, pushing the operating window and helping end-users to get even more from the process.
Control algorithm
Speedflo utilizes a proprietary advanced PDF+ control algorithm that is capable of extremely fast and accurate feedback control. In addition to the PDF+ algorithm the Speedflo controller features a digital variable structure control law that is able to maintain fast-acting and stable control, even when the MFC becomes fully open or closed. This enables feedback control that is high performance, robust and reliable.
Multiple control channels
The Speedflo controller has up to eight fully featured and independent control channels. This allows for simultaneous feedback control of eight MFCs, with options to combine various sensors and duplicate control channels. This powerful capability is especially useful for large target areas where precise deposition uniformity must be achieved.
Advanced user interface
A highly developed software interface includes many powerful functions to allow different methods of configuring the process control and combating difficult control situations. All of the software functions can be seamlessly incorporated into an existing PLC system.
Speedflo autotune
Achieving high performance control of your system is a quick and easy process using Speedflo.
A proprietary, state-of-the-art automatic controller tuning procedure provides optimum controller parameters for your process at the click of a button. The auto-tuning procedure is fast and effective – and works within any system or sensor configuration.
After performing an integrated system calibration and identification procedure, the auto-tuner instantly generates the optimum controller parameters for your process by using advanced inverse dynamics algorithms to analyze the collected data.
The whole procedure takes less than two minutes and, thanks to Gencoa’s unique combination of process and control expertise, is perfectly suited to the demands of real processes.
The following video shows an example of the auto-tuner during a AlOx reactive sputtering process using dual rotatable targets and with three commonly-used sensor types: Lambda oxygen sensor, target voltage sensor, and plasma emission monitoring (PEM) sensor.
