Production Magnetron Sputtering Sources (HV)
CTX SERIES PRODUCTION MAGNETRON SPUTTERING SOURCES
In larger 3D coating applications the CTX Series of cylindrical target magnetrons accomplishes the task in one easy step. With the sputtered flux arriving from the inner surface of the cylindrical target, this special source keeps the entire substrate surface "in the plasma" throughout the deposition for highly uniform film properties. Off-axis deposition and low damage films are easily realized. Custom built sources range from 6" to 24" ID. Targets can be machined from solid, rolled and bonded or plasma sprayed materials. Sources feature integral process gas distribution.
AJA International Inc, Massachusetts, USA
