Production Magnetron Sputtering Sources (HV)
TRIANGULAR SHAPED MAGNETRON SPUTTERING SOURCES
In cylindrical chamber configurations where substrates are fixed to the periphery of a rotating table or "spider", the ideal sputter source shape is triangular. This optimizes uniformity while minimizing the rate loss due to uniformity shielding. AJA has developed the unique TR5313 Concentric Triangular Magnetron Sputtering Source. These sources can be run with RF or any form of DC. Integral isolation chimneys, gas distribution systems and QCM ports are "designed in" for maximum uniformity and process control.
AJA International Inc, Massachusetts, USA
