SHQ-F - FIXED SUB. HEATERS/RAPID ANNEAL/O(2) FURNACE

For applications where the substrate is fixed in front of one or two quartz lamps, AJA builds 1” and 2” Ø HV and UHV heaters which reach 1000°C.  For 3” to 8” fixed substrates, substrate heaters, annealing stations and oxygen furnaces are available which can achieve 500°C to 900°C depending on requirements and design constraints.

SHQ-X - ROTATING SUBSTRATE HEATERS

Substrate rotation in front of AJA’s unique quartz lamp array optimizes both temperature and thin film deposition uniformity. SHQ-3X (up to 3” Ø substrates) and SHQ-4X (up to 4” Ø substrates) will achieve temperatures up to 850°C. SHQ-6X, SHQ-8X, SHQ-10X and SHQ-12X accommodate substrates from 6” to 12” Ø and can reach temperatures of up to 800°C.

SHQ-SIC - ROTATING/STATIC SUBSTRATE HEATERS

AJA’s silicon carbide substrate heaters are capable of achieving 1000°C in both the rotational and static mode.  AJA’s unique SiC element design is optimized for temperature uniformity with and without substrate rotation.  Additional options include manual or motorized z-motion, substrate gas ring, and RF/DC biasing.  Models available for 4”,6”, and 8” Ø substrates.

UNO SERIES - TILTING SUBSTRATE HEATERS

UNO Series substrate heaters allow up to +/- 200° rotation allowing either direct or angled deposition or etching.  The angled positioning can be manual or stepper motor controlled to within 0.1°. 

The GLAD (Glancing Angle Deposition) substrate heater above utilizes manual positioning and has azimuthal substrate rotation.

The special chemical duty UNO Series substrate heater above is compatible with reactive gases such as Chlorine and features a temperature range of 5°C to 200°C.

SHQ-15A/25A - PID POWER SUPPLY/TEMPERATURE CONTROLLERS

AJA manufactures two PID temperature controller/power supply units: the SHQ-15A (up to 2500 Watts) and the SHQ-25A (up to 5000 Watts). Both require 190 V - 240 V single phase power input and deliver +/- 1°C temperature stability and feature auto-tuning, external interlock and local/remote selector switch. Both models are half rack width x 3U.  19" rack adapters are available from stock for these compact units.  The controller also allows pre-programming (2) sets of PID values for seamless transition between low and high temperatures without re-tuning. 

MXMC / SXMC - SUBSTRATE HEATER MOTION CONTROLLERS

The SXMC (single axis motor controller) is used in “rotation only” designs. The MXMC (multi axis motor controller) is used to rotate the substrate and to control motorized Z motion. Z motion is useful for adjusting working distances in deposition systems and in transfer and/or analysis.The MXMC adds a 4 position joystick (Up/Down/Jog CW/Jog CCW) which controls both the rotation and the Z motion motors. These controllers require a 190 V 240 V single phase power input and are designed to drive 12 VDC gear motors.