STX Series Circular Magnetron Sputtering Sources

STX Series Sources have targets from 5" to 12" Ø. These sources feature a special modular magnet array allowing for balanced, unbalanced, magnetic material, closed field, high utilization and high uniformity configurations. These units run with high power DC, Pulsed DC, HiPIMS, AC, and RF and feature direct or indirect water cooled backing plates. Both internal and external mounting is available.  Tilt gimbals are offered with some sources for long throw, con-focal deposition at pressures as low as 0.2 mTorr.

STXL Series Rectangular Magnetron Sputtering Sources

STXL Sources are offered for targets from 75 mm x 300 mm to 150 mm x
1 meter. These sources feature a special modular magnet array allowing for balanced, unbalanced, magnetic material, closed field, high utilization and high uniformity configurations. These units run with high power DC, Pulsed DC, HIPIMS, AC, and RF and feature direct or indirect water cooled backing plates. Internal and external mounting is offered. Adjustable gas injection frames optimize uniformity regardless of pump location dynamics.