Lithium Nickel Oxide Sputtering
Target Description
Lithium Nickel Oxide Sputtering Target is a specialized material used in the process of sputter deposition, a technique employed in thin-film manufacturing and coating applications.
Sputtering is a technique used to deposit thin films of material onto a substrate. It involves bombarding a target material with high-energy ions, causing atoms or molecules to be ejected from the target surface. These ejected particles then deposit onto the substrate, forming a thin film.
Lithium Nickel Oxide is a compound composed of lithium (Li), nickel (Ni), and oxygen (O) atoms. It is often used in the production of cathode materials for lithium-ion batteries. The sputtering process allows for precise control over the deposition of thin films, making it valuable in various industries, including electronics, energy storage, and optics. The use of Lithium Nickel Oxide Sputtering Targets contributes to the creation of thin films with specific properties and compositions for diverse applications.
Lithium Nickel Oxide Sputtering Target Specifications
|
Compound Formula |
LiNiO2 |
|
Molecular Weight |
97.63 |
|
Appearance |
Gray Target |
|
Melting Point |
>1000℃ |
|
Density |
– |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Lithium Nickel Oxide Sputtering Target Handling Notes
- Indium bonding is recommended for Lithium Nickel Oxide Sputtering Targets, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Lithium Nickel Oxide Sputtering Target Application
Lithium Nickel Oxide Sputtering Target is widely used in various industries, including electronics, energy storage, and optics.
Lithium Nickel Oxide Sputtering Target Packaging
Our Lithium Nickel Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.