Vanadium Oxide Sputtering
Target Description
Vanadium Oxide Sputtering Target is a specialized material used in the sputter deposition process. Sputter deposition is a technique employed in the production of thin films for various applications in electronics, optics, and coatings.
The sputtering target is a high-purity form of V2O3, designed to provide a controlled and precise source of vanadium(III) oxide during the thin-film deposition process.
Vanadium Oxide Sputtering Target Specifications
|
Compound Formula |
V2O3 |
|
Molecular Weight |
149.88 |
|
Appearance |
Black Target |
|
Melting Point |
1940℃ |
|
Density (g/cm3) |
4.339 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Vanadium Oxide Sputtering Target Handling Notes
- Indium bonding is recommended for the Vanadium Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Vanadium Oxide Sputtering Target Application
Vanadium Oxide Sputtering Target is used in the fabrication of electronic devices and components.
Vanadium Oxide Sputtering Target Packaging
Our Vanadium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.