Yttrium Iron Garnet PLD
Target Description
Yttrium Iron Garnet PLD Target is a specialized material used in the sputter deposition process. Sputter deposition is a widely used technique in the production of thin films for various applications in electronics, magnetics, and optics.
YIG is known for its unique magnetic and optical properties, making it valuable in various applications. The sputter deposition process involves bombarding the target material (Yttrium Iron Garnet Sputtering Target) with high-energy ions in a vacuum chamber. This causes atoms or particles from the target material to be ejected, and these ejected particles then deposit onto a substrate, forming a thin film.
Yttrium Iron Garnet PLD Target Specifications
|
Compound Formula |
Y3Fe5O12 |
|
Molecular Weight |
737.94 |
|
Appearance |
Green target |
|
Melting Point |
N/A |
|
Density (g/cm3) |
5.11 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Yttrium Iron Garnet PLD Target Handling Notes
- Indium bonding is recommended for Yttrium Iron Garnet PLD Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity, and is susceptible to thermal shock.
Yttrium Iron Garnet PLD Target Application
Yttrium Iron Garnet PLD Target is widely used in various applications in electronics, magnetics, and optics.
Yttrium Iron Garnet PLD Target Packaging
Our Yttrium Iron Garnet PLD Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.