Manganese Dioxide Sputtering
Target Description
Manganese Dioxide Sputtering Target is a specialized material used in the process of sputter deposition. Sputter deposition is a technique commonly employed in thin-film manufacturing and coating applications.
Manganese dioxide itself is known for its versatility and is used in batteries, catalysts, and other applications, so having a sputtering target allows for the customization and fine-tuning of thin films with specific properties for different technological purposes.
Manganese Dioxide Sputtering Target Specifications
|
Compound Formula |
MnO2 |
|
Molecular Weight |
86.94 |
|
Appearance |
Black Target |
|
Melting Point |
>1000℃ |
|
Density |
– |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Manganese Dioxide Sputtering Target Handling Notes
- Indium bonding is recommended for the Manganese Dioxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Manganese Dioxide Sputtering Target Application
Manganese Dioxide Sputtering Target has various applications in electronics, optics, sensors, and other industries.
Manganese Dioxide Sputtering Target Packaging
Our Manganese Dioxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.