Zinc Oxide with Alumina Sputtering Target Description Zinc Oxide with Alumina sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula ZnO/Al2O3. Zinc is a chemical element that originated from the German, ‘zinc’, which may, in turn, be derived from the Persian word ‘sing’, meaning stone. It was early used before 1000 BC and discovered by Indian metallurgists. “Zn” is the canonical chemical symbol of zinc. Its atomic number in the periodic table of elements is 30 with a location at Period 4 and Group 12, belonging to the d-block. The relative atomic mass of zinc is 65.409(4) Dalton, the number in the brackets indicating the uncertainty. Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaning bitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty. Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty. Zinc Oxide with Alumina Sputtering Target Bonding Indium Bonding and Elastomeric Target Bonding Service are available for Zinc Oxide with Alumina sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Zinc Oxide with Alumina Sputtering Target Packaging Our Zinc Oxide with Alumina Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Calcium Zirconate Sputtering Target Description Calcium is a chemical element originated from the Latin ‘calx’ meaning lime. It was first mentioned in 1808 and observed by H. Davy. The isolation was later accomplished and announced by H. Davy. “Ca” is the canonical chemical symbol of calcium. Its atomic number in the periodic table of elements is 20 with location at Period 4 and Group 2, belonging to the s-block. The relative atomic mass of calcium is 40.078(4) Dalton, the number in the brackets indicating the uncertainty. Zirconium is a chemical element originated from the Persian ‘zargun’, meaning gold coloured. It was first mentioned in 1789 and observed by H. Klaproth. The isolation was later accomplished and announced by J. Berzelius. “Zr” is the canonical chemical symbol of zirconium. Its atomic number in the periodic table of elements is 40 with location at Period 5 and Group 4, belonging to the d-block. The relative atomic mass of zirconium is 91.224(2) Dalton, the number in the brackets indicating the uncertainty. Calcium Zirconate Sputtering Target Application The calcium zirconate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Calcium Zirconate Sputtering Target Packing Our calcium zirconate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Calcium Ruthenate Sputtering Target Description Calcium is a chemical element originated from the Latin ‘calx’ meaning lime. It was first mentioned in 1808 and observed by H. Davy. The isolation was later accomplished and announced by H. Davy. “Ca” is the canonical chemical symbol of calcium. Its atomic number in the periodic table of elements is 20 with location at Period 4 and Group 2, belonging to the s-block. The relative atomic mass of calcium is 40.078(4) Dalton, the number in the brackets indicating the uncertainty. Ruthenium is a chemical element originated from Russia (with the Latin name Ruthenia). It was first mentioned in 1807 and observed by J. Sniadecki. The isolation was later accomplished and announced by J. Sniadecki. “Ru” is the canonical chemical symbol of ruthenium. Its atomic number in the periodic table of elements is 44 with location at Period 5 and Group 8, belonging to the d-block. The relative atomic mass of ruthenium is 101.07(2) Dalton, the number in the brackets indicating the uncertainty. Calcium Ruthenate Sputtering Target Application The calcium ruthenate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Calcium Ruthenate Sputtering Target Packing Our calcium ruthenate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Indium Gallium Oxide IGO Sputtering Target Description Indi um is a chemical element originated from the Latin ‘indicium’, meaning violet or indigo. It was first mentioned in 1863 and observed by F. Reich and T. Richter. The isolation was later accomplished and announced by T. Richter. “In” is the canonical chemical symbol of indium. Its atomic number in the periodic table of elements is 49 with location at Period 5 and Group 13, belonging to the p-block. The relative atomic mass of indium is 114.818(3) Dalton, the number in the brackets indicating the uncertainty. Gallium is a chemical element originated from France (with the Latin name Gallia). It was first mentioned in 1875 and observed by P. E. L. de Boisbaudran. The isolation was later accomplished and announced by P. E. L. de Boisbaudran. “Ga” is the canonical chemical symbol of gallium. Its atomic number in the periodic table of elements is 31 with location at Period 4 and Group 13, belonging to the p-block. The relative atomic mass of gallium is 69.723(1) Dalton, the number in the brackets indicating the uncertainty. Indium Gallium Oxide IGO Sputtering Target Application The indium gallium oxide IGO sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Indium Gallium Oxide IGO Sputtering Target Packing Our indium gallium oxide IGO sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

Barium Niobate Sputtering Target Description Barium is a chemical element originated from the Greek ‘barys’, meaning heavy. It was first mentioned in 1772 and observed by W. Scheele. The isolation was later accomplished and announced by H. Davy. “Ba” is the canonical chemical symbol of barium. Its atomic number in the periodic table of elements is 56 with location at Period 6 and Group 2, belonging to the s-block. The relative atomic mass of barium is 137.327(7) Dalton, the number in the brackets indicating the uncertainty. Niobium is a chemical element originated from Niobe, daughter of king Tantalus from Greek mythology. It was first mentioned in 1801 and observed by C. Hatchett. The isolation was later accomplished and announced by W. Blomstrand. “Nb” is the canonical chemical symbol of niobium. Its atomic number in the periodic table of elements is 41 with location at Period 5 and Group 5, belonging to the d-block. The relative atomic mass of niobium is 92.906 38(2) Dalton, the number in the brackets indicating the uncertainty. Barium Niobate Sputtering Target Application The barium niobate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Barium Niobate Sputtering Target Packaging Our barium niobate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Barium Cerium Oxide Sputtering Target Description Barium is a chemical element originated from the Greek ‘barys’, meaning heavy. It was first mentioned in 1772 and observed by W. Scheele. The isolation was later accomplished and announced by H. Davy. “Ba” is the canonical chemical symbol of barium. Its atomic number in the periodic table of elements is 56 with location at Period 6 and Group 2, belonging to the s-block. The relative atomic mass of barium is 137.327(7) Dalton, the number in the brackets indicating the uncertainty. Cerium is a chemical element originated from Ceres, the Roman God of agriculture. It was first mentioned in 1803 and observed by H. Klaproth, J. Berzelius, and W. Hisinger. The isolation was later accomplished and announced by G. Mosander. “Ce” is the canonical chemical symbol of cerium. Its atomic number in the periodic table of elements is 58 with location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of cerium is 140.116(1) Dalton, the number in the brackets indicating the uncertainty. Barium Cerium Oxide Sputtering Target Application The barium cerium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Barium Cerium Oxide Sputtering Target Packaging Our barium cerium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Calcium Oxide Sputtering Target Description Calcium Oxide is a widely used chemical compound. It is a white, caustic, alkaline, crystalline solid at room temperature. The broadly used term lime connotes calcium-containing inorganic materials, in which carbonates, oxides and hydroxides of calcium, silicon, magnesium, aluminium, and iron predominate. By contrast, quicklime specifically applies to the single chemical compound calcium oxide. Manufacturing Process • Manufacturing – Cold pressed – Sintered, Elastomer bonded to the backing plate • Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment Calcium Oxide Sputtering Target Specification Material Type Calcium Oxide Symbol CaO Color/Appearance White Target Melting Point 2,572° C(4,662° F) Sputter RF-R Density 3.3 g/cm3 Calcium Oxide Packing Our calcium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

AZO Sputtering Target Description AZO sputtering target, or aluminum-doped zinc oxide target, contains the element of Al, Zn and O. Aluminum, or aluminium, is a chemical element derived from the alum name in Latin, and “alumen” stands for bitter salt. “Al” is the standard chemical symbol for aluminum. Aluminum films are often used as reflective coatings on telescopes, car headlights, mirrors, packaging and toys. The Aluminum target is widely used in the aerospace, automotive lighting, OLED and optical industries. Zinc is a chemical element that originated in German as “zinc”; zinc is also considered that it be derived from Persian word “sing”, which means stone. “Zn” is the standard chemical symbol for zinc. Its atomic number in the periodic table is 30. AZO Sputtering Target Specification Material Type Aluminum doped Zinc Oxide Symbol AZO Appearance Solid in various forms Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ AZO Sputtering Target Manufacturing Process • Manufacturing – Cold pressed – Sintered, Elastomer bonded to the backing plate • Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment AZO Sputtering Target Application AZO sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. Aluminum-doped zinc oxide was investigated for replacing ITO, e.g., in solar cells, due to the concern of indium shortage and increasing price. AZO Sputtering Packing Aluminum-doped zinc oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Barium Oxide Sputtering Target Description Barium oxide sputtering target is a type of oxide ceramic sputtering target composed of Barium and oxide. Barium is a chemical element originated from the Greek ‘barys’, meaning heavy. It was first mentioned in 1772 and observed by W. Scheele. The isolation was later accomplished and announced by H. Davy. “Ba” is the canonical chemical symbol of barium. Its atomic number in the periodic table of elements is 56 with location at Period 6 and Group 2, belonging to the s-block. The relative atomic mass of barium is 137.327(7) Dalton, the number in the brackets indicating the uncertainty. Manufacturing Process • Manufacturing – Cold pressed – Sintered, Elastomer bonded to the backing plate • Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment. Barium Oxide Sputtering Target Specification Material Type Barium Oxide Symbol BaO Color/Appearance White, Crystalline Solid Melting Point 1,923°C Sputter RF, RF-R, DC Type of Bond Indium, Elastomer Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Barium Oxide Sputtering Target Bonding Services Indium Bonding and Elastomeric Target Bonding Service are available for the barium oxide sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Barium Oxide Packing Our barium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.