Cadmium Oxide Sputtering Target Description Cadmium oxide sputtering target is a type of oxide ceramic sputtering target composed of Cadmium and oxide. Cadmium is a chemical element originated from the Latin name for the mineral calmine, ‘cadmia’. It was first mentioned in 1817 and observed by S. L Hermann, F. Stromeyer, and J.C.H. Roloff. The isolation was later accomplished and announced by S. L Hermann, F. Stromeyer, and J.C.H. Roloff. “Cd” is the canonical chemical symbol of cadmium. Its atomic number in the periodic table of elements is 48 with location at Period 5 and Group 12, belonging to the d-block. The relative atomic mass of cadmium is 112.411(8) Dalton, the number in the brackets indicating the uncertainty Cadmium Oxide Sputtering Target Specifications Material Type Cadmium Oxide Symbol CdO Color/Appearance White Target Melting Point 900-1000 °C (1652-1832 ° F) Boiling Point 1,559° C (2,838° F) Density 8.15 g/cm3 Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information. Cadmium Oxide Sputtering Target Packing The cadmium oxide sputtering targets from Stanford Advanced Materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

High Purity IrO2 Sputter Targets for Thin-film Application Iridium oxide is a blue-black solid. IrO2 is the only well-characterized oxide of iridium. The structure of IrO2 is similar to the TiO2 rutile structure, featuring six-coordinate iridium and three-coordinate oxygen. There are several different methods for obtaining iridium oxide, which can be divided into two categories: modification and reactive deposition. Iridium Oxide Sputtering Target Specification Parameter Value Material Iridium Oxide (IrO₂) Appearance Black, Solid Target Purity 99.9% – 99.99% Density 11.7 g/cm³ Melting Point ~1,100 °C Bonding Options Indium, Elastomer Sputtering Method RF or DC Reactive Sputtering Available Sizes Dia. 1″–6″, Thick. 0.125″–0.25″ Custom Shapes Available on request Note: Due to its brittleness and reactivity during deposition, elastomer bonding is recommended for better thermal shock absorption. Iridium Oxide Applications Iridium oxide sputtering targets are widely used in: Microelectronic Devices – Passivation layers, barrier films Electrodes – Coatings for dimensionally stable anodes in chlor-alkali electrolysis, fuel cells, and electrochemical sensors Bioelectronics – Microelectrodes in electrophysiology and neural interfaces Photovoltaics & Displays – Transparent conductive oxides, antireflection coatings Catalysis & Energy – IrO₂ thin films as part of OER (oxygen evolution reaction) catalysts for PEM electrolyzers Iridium Oxide Sputtering Target Bonding Services SAM offers professional target bonding for high-temperature sputtering applications. For IrO₂, we recommend: Elastomer Bonding – Best for managing thermal expansion stress Indium Bonding – Optional if thermal cycling is controlled Available Backing Plates: Copper, Molybdenum, Stainless Steel Iridium Oxide Packaging All IrO₂ targets are: Vacuum-sealed in anti-static, cleanroom-grade packaging Labeled with batch number and COA (Certificate of Analysis) Shipped with foam protection inside impact-resistant containers

Strontium Oxide Sputtering Target Description The strontium oxide sputtering target is a colorless sputtering target composed of high purity strontium oxide. Strontium oxide or strontia, SrO, is formed when strontium reacts with oxygen. It is a colorless cubic crystal. Burning strontium in air results in a mixture of strontium oxide and strontium nitride. It also forms from the decomposition of strontium carbonate SrCO3. It is a strongly basic oxide. Strontium Oxide Sputtering Target Specification Material Type Strontium Oxide Symbol SrO Color/Appearance Colorless Cubic Crystals Melting Point 2,531° C (4,588° F) Boiling Point 3200 °C (5792 °F) Density 4.7 g/cm3 Type of Bond Indium, Elastomer Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information. Strontium Oxide Sputtering Target Bonding Service Indium Bonding and Elastomeric Target Bonding Service are available for strontium oxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Strontium Sputtering Target Application The strontium oxide sputtering materials are used for CD-ROM, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Strontium oxide can be used in glass, optics and ceramic industries, such as the manufacture of television picture tube glass. It is also an active ingredient in paint dryers. It can also be used to prepare pure strontium by heating with aluminum under vacuum. Strontium Sputtering Target Packaging Our strontium oxide sputter coater target is carefully packaged in the plastic vacuum bag to prevent damage during storage and transportation and to preserve the quality of our products in their original condition. Also, the COA of the raw material would be packaged with the product.

Fluorine Doped Tin Oxide FTO Sputtering Target Description Tin, also called stannum, is a chemical element originated from the Anglo-Saxon word tin (stannum in Latin, meaning hard). It was early used in 3500 BC. “Sn” is the canonical chemical symbol of tin. Its atomic number in the periodic table of elements is 50 with the location at Period 5 and Group 14, belonging to the p-block. The relative atomic mass of tin is 118.710(7) Dalton, the number in the brackets indicating the uncertainty. SnO2 has been proved a wide band-gap semiconductor that exhibits n-type character and high optical transparency due to its oxygen vacancies. When doped with fluorine, the material FTO exhibits well visible transparency. Also, FTO is mechanically, chemically and electrochemically stable. Fluorine Doped Tin Oxide FTO Sputtering Target Specification Material Type Fluorine Doped Tin Oxide (FTO) Symbol SnO2/F Color/Appearance Sage green target Melting Point >1630° C Fluorine Doped Tin Oxide FTO Sputtering Target Application The fluorine doped tin oxide FTO sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Fluorine Doped Tin Oxide FTO Sputtering Target Packaging Our fluorine doped tin oxide FTO sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Barium Cerium Yttrium Zirconate Sputtering Target Description Barium cerium yttrium zirconate sputtering target is composed of barium, cerium, yttrium, zirconium, and oxide with the chemical formula of BZCY or BaCe(1-x-y)Y(x)Zr(y)O3. High-purity barium cerium yttrium zirconate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Barium Cerium Yttrium Zirconate Sputtering Target Specification Material Type Barium Cerium Yttrium Zirconate Sputtering Target Symbol BaCe(1-x-y)Y(x)Zr(y)O3 Color/Appearance Solid Melting Point N/A Sputter RF, DC Type of Bond Elastomer, Indium Synonyms BCZY, BZCY721, BZCY72, yttrium and cerium-doped barium zirconium oxide, ceria- and yttria-substituted barium zirconate Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Barium Cerium Yttrium Zirconate Sputtering Target Packaging Our barium cerium yttrium zirconate sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Barium Ferrite Sputtering Target Description Barium ferrite sputtering target is composed of barium, iron, and oxide with the chemical formula of BaFe12O19. High-purity BaFe12O19 sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Barium Ferrite Sputtering Target Specification Material Type Barium ferrite sputtering target Symbol BaCe(1-x-y)Y(x)Zr(y)O3 Color/Appearance Solid Melting Point 1300 °C Density 5.28 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Barium Ferrite Sputtering Target Target Bonding Elastomer and Indium bonding is available for the barium ferrite sputtering targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Barium Ferrite Sputtering Target Packaging Our barium ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Bismuth Calcium Ferrite Sputtering Target Description Bismuth calcium ferrite sputtering target is composed of bismuth, calcium, iron, and oxide with the chemical formula of Bi0.9Ca0.1FeO3. High-purity bismuth calcium ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Bismuth Calcium Ferrite Sputtering Target Specification Material Type Bismuth calcium ferrite Symbol Bi0.9Ca0.1FeO3 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Bismuth Calcium Ferrite Sputtering Target Packaging Our bismuth calcium ferrite sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Bismuth Dysprosium Iron Gallate Sputtering Target Description Bismuth dysprosium iron gallate is composed of bismuth, dysprosium, iron, gallium, and oxide with the chemical formula of Bi0.9Ca0.1FeO3. High-purity bismuth dysprosium iron gallate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Bismuth Dysprosium Iron Gallate Sputtering Target Specification Material Type Bismuth dysprosium iron gallate Symbol Bi2DyFe4GaO12 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Bismuth Dysprosium Iron Gallate Sputtering Target Packaging Our bismuth dysprosium iron gallate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Bismuth Lanthanum Ferrite Sputtering Target Description Bismuth lanthanum ferrite is composed of bismuth, lanthanum, iron, and oxide with the chemical formula of Bi0.9Ca0.1FeO3. High-purity bismuth lanthanum ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Bismuth Lanthanum Ferrite Sputtering Target Specification Material Type Bismuth Lanthanum Ferrite Symbol Bi2DyFe4GaO12 Color/Appearance Gray solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Bismuth Lanthanum Ferrite Sputtering Target Packaging Our bismuth lanthanum ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.