Vanadium Dioxide Sputtering
Target Description
Vanadium Dioxide Sputtering Target is a specialized material used in the sputter deposition process. Sputter deposition is a technique employed in the production of thin films for various applications in electronics, optics, and coatings.
VO2 is known for exhibiting a unique property called the metal-insulator transition. At a specific temperature known as the transition temperature, VO2 undergoes a phase transition from an insulating state to a metallic state, accompanied by a change in its electrical conductivity.
Vanadium Dioxide Sputtering Target Specifications
|
Compound Formula |
VO2 |
|
Molecular Weight |
82.94 |
|
Appearance |
Black Target |
|
Melting Point |
1967℃ |
|
Density (g/cm3) |
4.339 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Vanadium Dioxide Sputtering Target Handling Notes
- Indium bonding is recommended for the Vanadium Dioxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Vanadium Dioxide Sputtering Target Application
Vanadium Dioxide Sputtering Target is used for various applications in electronics, optics, and coatings.
Vanadium Dioxide Sputtering Target Packaging
Our Vanadium Dioxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.