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Sputtering Targets

Different Shapes of Sputtering Targets

(주)연진에스텍은 Planar (Flat) TargetRotary (Cylindrical) Target, Circular (Disc)TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 특이한 요청 시 타겟 크기의 커스터마이즈가 가능합니다.

 

Key Features

  • High Purity & Performance: 일관된 증착 품질과 오염을 줄이도록 가공합니다.
  • Material Variety: 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
  • Custom Manufacturing: 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
  • Precision Design: 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
  • Flexible Supply Chain: 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.

 


OXIDE TARGET

Barium Ruthenium Oxide Sputtering Target, BaRuO3

 

Barium Ruthenium Oxide Sputtering

Target Description

 

Barium Ruthenium Oxide is an oxide with metallic conductivity that displays good electronic conductivity, making it an ideal material choice for thin film deposition in semiconductors and electronic devices. It possesses some catalytic activity, which makes Barium Ruthenium oxide potentially promising for catalytic applications. Barium Ruthenium oxide may have high thermal stability, which allows it to maintain certain physical and chemical properties at high temperatures. Through precision preparation, Barium Ruthenium Oxide Sputtering Targets maintain high purity, ensuring that they provide excellent performance and stability in research and industrial applications.

 

 

Barium Ruthenium Oxide Sputtering Target Specifications

Compound Formula

BaRuO3

Molecular Weight

286.39

Appearance

Black Target

Melting Point

Density

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Barium Ruthenium Oxide Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Barium Ruthenium Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Barium Ruthenium Oxide Sputtering Target Application

  1. Semiconductor Preparation: As a thin film deposition material, Barium Ruthenium oxide is widely used in the semiconductor industry to prepare conductive layers for electronic devices and to improve device performance.
  2. Optoelectronics: The sputtering target is widely used in the field of optoelectronics for the production of photodiodes, photodetectors, and other optical components.
  3. Magnetic Materials Research: The magnetic properties of Barium Ruthenium oxide make it ideal for magnetic materials research, with possible applications in magnetic memory devices and magnetic sensors.
  4. Catalytic applications: Barium Ruthenium oxide with its catalytic activity can be used to catalyze reactions and may play a key role in chemical synthesis and energy.
  5. High-temperature stable materials: Due to its relatively high thermal stability, Barium Ruthenium oxide can be used in the preparation of materials for high-temperature environments, such as high-temperature electronic devices.

 

Barium Ruthenium Oxide Sputtering Target Packaging

Our Barium Ruthenium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

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