Indium Iron Oxide Sputtering
Target Description
Indium iron oxide sputtering target is composed of indium, iron and oxide with the chemical formula of InFe2O4. High-purity indium iron oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Indium Iron Oxide Sputtering Target Specification
|
Material Type |
Indium Iron Oxide |
|
Symbol |
InFe2O4 |
|
Color/Appearance |
Reddish Solid |
|
Melting Point |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Indium Iron Oxide Sputtering Target Application
The indium iron oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Packaging of Indium Iron Oxide Sputtering Target
Our indium iron oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.