Lanthanum Ferrite Sputtering
Target Description
Lanthanum ferrite sputtering target is composed of lanthanum, iron, and oxygen with the chemical formula LaFeO3. High-purity lanthanum ferrite sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Lanthanum Ferrite Sputtering Target Specification
|
Material Type |
Lanthanum Ferrite |
|
Symbol |
LaFeO3 |
|
Color/Appearance |
Solid |
|
Melting Point |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Lanthanum Ferrite Sputtering Target Application
The lanthanum ferrite sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Lanthanum Ferrite Sputtering Target Bonding Services
Target Bonding Service is available for lanthanum ferrite sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
Lanthanum Ferrite Sputtering Target Packaging
Our lanthanum ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.