Indium Molybdenum Oxide Sputtering
Target Description
Indium molybdenum oxide sputtering target is composed of indium oxide and molybdenum with the chemical formula of In2O3/Mo or IMO. The composition ratio is 98 wt% and 2 wt%, respectively. High-purity indium molybdenum oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Indium Molybdenum Oxide Sputtering Target Specification
|
Material Type |
Indium Molybdenum Oxide |
|
Symbol |
In2O3/Mo, IMO |
|
Color/Appearance |
Solid |
|
Melting Point |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Indium Molybdenum Oxide Sputtering Target Application
The indium molybdenum oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Indium Molybdenum Oxide Sputtering Target Packaging
Our indium molybdenum oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.