Lanthanum Copper Manganate Sputtering
Target Description
Lanthanum copper manganate sputtering target is composed of lanthanum, copper, manganese and oxygen with the chemical formula La2CuMnO6. High-purity lanthanum copper manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Lanthanum Copper Manganate Sputtering Target Specification
|
Material Type |
Lanthanum Copper Manganate |
|
Symbol |
La2CuMnO6 |
|
Color/Appearance |
Solid |
|
Melting Point |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Lanthanum Copper Manganate Sputtering Target Application
The lanthanum copper manganate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Lanthanum Copper Manganate Sputtering Target Packing
Our lanthanum copper manganate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.