Lanthanum Barium Manganate Sputtering
Target Description
Lanthanum barium manganate sputtering target is composed of lanthanum, barium, manganese, and oxygen. High-purity lanthanum barium manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Lanthanum Barium Manganate Sputtering Target Specification
|
Material Type |
Lanthanum Barium Manganate |
|
Symbol |
La(1-x)BaxMnO3, LBM |
|
Color/Appearance |
Solid |
|
Melting Point |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Lanthanum Barium Manganate Sputtering Target Application
The lanthanum barium manganate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Lanthanum Barium Manganate Sputtering Target Packing
Our lanthanum barium manganate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.