Barium Oxide Sputtering Target Description
Barium oxide sputtering target is a type of oxide ceramic sputtering target composed of Barium and oxide.
Barium is a chemical element originated from the Greek ‘barys’, meaning heavy. It was first mentioned in 1772 and observed by W. Scheele. The isolation was later accomplished and announced by H. Davy. “Ba” is the canonical chemical symbol of barium. Its atomic number in the periodic table of elements is 56 with location at Period 6 and Group 2, belonging to the s-block. The relative atomic mass of barium is 137.327(7) Dalton, the number in the brackets indicating the uncertainty.
Manufacturing Process
• Manufacturing – Cold pressed – Sintered, Elastomer bonded to the backing plate
• Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants, Protection during shipment.
Barium Oxide Sputtering Target Specification
|
Material Type |
Barium Oxide |
|
Symbol |
BaO |
|
Color/Appearance |
White, Crystalline Solid |
|
Melting Point |
1,923°C |
|
Sputter |
RF, RF-R, DC |
|
Type of Bond |
Indium, Elastomer |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Barium Oxide Sputtering Target Bonding Services
Indium Bonding and Elastomeric Target Bonding Service are available for the barium oxide sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
Barium Oxide Packing
Our barium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.