Barium Ferrite Sputtering
Target Description
Barium ferrite sputtering target is composed of barium, iron, and oxide with the chemical formula of BaFe12O19. High-purity BaFe12O19 sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Barium Ferrite Sputtering Target Specification
|
Material Type |
Barium ferrite sputtering target |
|
Symbol |
BaCe(1-x-y)Y(x)Zr(y)O3 |
|
Color/Appearance |
Solid |
|
Melting Point |
1300 °C |
|
Density |
5.28 g/cm3 |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Barium Ferrite Sputtering Target Target Bonding
Elastomer and Indium bonding is available for the barium ferrite sputtering targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
Barium Ferrite Sputtering Target Packaging
Our barium ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.