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Sputtering Targets

Different Shapes of Sputtering Targets

(주)연진에스텍은 Planar (Flat) TargetRotary (Cylindrical) Target, Circular (Disc)TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 특이한 요청 시 타겟 크기의 커스터마이즈가 가능합니다.

 

Key Features

  • High Purity & Performance: 일관된 증착 품질과 오염을 줄이도록 가공합니다.
  • Material Variety: 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
  • Custom Manufacturing: 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
  • Precision Design: 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
  • Flexible Supply Chain: 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.

 


OXIDE TARGET

Barium Bismuth Oxide Sputtering Target, BaBiO3


 

Barium Bismuth Oxide Sputtering

Target Description

Barium Bismuth Oxide Sputtering Target is a specialized material utilized in the sputtering process for thin film deposition. In sputtering, high-energy ions are directed at a target material, causing the release of atoms from the target surface. These atoms then deposit onto a substrate, forming a thin film with specific properties.

Barium Bismuth Oxide has garnered significant attention in the realm of material science owing to its distinctive properties. Notably, Barium Bismuth Oxide has been observed to exhibit superconducting characteristics in specific studies, elevating its significance in the exploration of superconducting materials. The manifestation of superconductivity in Barium Bismuth Oxide positions it as a subject of keen research interest for applications in low-temperature technologies and advancements in the field of materials with zero electrical resistance.

In addition to its superconducting attributes, Barium Bismuth Oxide may also demonstrate magnetic properties, primarily influenced by the presence of bismuth within its composition.  This dual nature of Barium Bismuth Oxide, showcasing both superconducting and magnetic properties, underscores its versatility and potential for applications in various scientific and technological domains.

 

 

Barium Bismuth Oxide Sputtering Target Specifications

Compound Formula

BaBiO3

Molecular Weight

394.31

Appearance

White Target

Melting Point

Density

7.6 g/cm3

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Barium Bismuth Oxide Sputtering Target Handling Notes

  1. Indium bonding is recommended for Barium Bismuth Oxide Sputtering Targets, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Barium Bismuth Oxide Sputtering Target Application

  1. Superconducting electronics: Barium Bismuth Oxide has demonstrated superconductivity in many studies, which makes Barium Bismuth Oxide Sputtering Targets potentially useful in the preparation of superconducting electronic devices. The superconducting properties could be used in the manufacture of superconducting cables, magnetic resonance imaging devices and other fields.
  2. Optoelectronics: Barium Bismuth Oxide’s optical properties may make it useful in the field of optoelectronics for the preparation of optical components such as photodiodes and lasers.
  3. Magnetic materials research: Due to the presence of bismuth, Barium Bismuth Oxide may exhibit certain magnetic properties, and therefore can be used in magnetic materials research, which may involve magnetic memory devices and other fields.
  4. Preparation of electrical devices: The electrical properties of Barium Bismuth Oxide Sputtering Targets may make them suitable for the thin film deposition of electrical devices, such as thin film transistors.

 

Barium Bismuth Oxide Sputtering Target Packaging

Our Barium Bismuth Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

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