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Sputtering Targets

Different Shapes of Sputtering Targets

(주)연진에스텍은 Planar (Flat) TargetRotary (Cylindrical) Target, Circular (Disc)TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 특이한 요청 시 타겟 크기의 커스터마이즈가 가능합니다.

 

Key Features

  • High Purity & Performance: 일관된 증착 품질과 오염을 줄이도록 가공합니다.
  • Material Variety: 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
  • Custom Manufacturing: 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
  • Precision Design: 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
  • Flexible Supply Chain: 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.

 


OXIDE TARGET

Calcium Vanadium Oxide Sputtering Target, CaVO3


 

Calcium Vanadium Oxide Sputtering

Target Description

 

Calcium Vanadium Oxide Sputtering Targets provided by Stanford Advanced Materials (SAM) are extremely pure, ensuring that the chemical purity of the material is maintained during the deposition process. Structural stability allows for excellent performance over long periods, reducing equipment maintenance. Calcium Vanadium Oxide Sputtering Targets exhibit outstanding conductivity, which contributes to uniform deposition and improved film quality and uniformity. Besides, excellent surface flatness ensures the high quality and accuracy of deposited films. Unsurpassed thermal conductivity helps to effectively manage temperatures during the sputtering process, improving deposition efficiency.

 

Calcium Vanadium Oxide Sputtering Target Specifications

 

Compound Formula

CaVO3

Molecular Weight

139.02

Appearance

White Target

Melting Point

Density

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Calcium Vanadium Oxide Sputtering Target Handling Notes

  1. Indium bonding is recommended for Calcium Vanadium oxide Sputtering Targets, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Calcium Vanadium Oxide Sputtering Target Application

  1. Semiconductor Manufacturing: High-purity CaVO3 ensures that deposited films have a precise chemical composition, improving the performance and stability of transistors and integrated circuits.
  2. Optical Coatings: The surface flatness and purity of the target ensures uniform deposition on optical films, making it ideal for high-precision optical devices such as lasers, optical lenses, and sensors.
  3. Display Technology: Calcium Vanadium oxide Sputtering Targets are used to create transparent, high-quality conductive layers in LCD and OLED screen manufacturing, improving the performance and clarity of display devices.
  4. Energy Storage: As a thin film material in batteries and energy storage devices, CaVO3’s conductive and thermally conductive properties help improve the efficiency and stability of energy storage devices.
  5. Conductive Coatings: Preparation of conductive thin films for sensors and electronic components ensures the reliability and long life of devices.
  6. Magnetic materials research: In the sputter deposition of magnetic materials, Calcium Vanadium oxide Sputtering Targets provide a reliable basis for research in magnetic storage and magnetic sensors, contributing to the development of these fields.

 

Calcium Vanadium oxide Sputtering Target Packaging

Our Calcium Vanadium Oxide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

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