Bismuth Vanadate Sputtering
Targets Description
Bismuth Vanadate Sputtering Target is a specialized material used in a technique called sputter deposition. This process is a common method for depositing thin films of material onto a substrate in a controlled and precise manner.
Bismuth vanadate is a compound made up of bismuth (Bi), vanadium (V), and oxygen (O). It is known for its interesting optical and electronic properties, making it suitable for applications in areas such as solar energy conversion and photocatalysis.
Bismuth Vanadate Sputtering Targets Specifications
|
Compound Formula |
BiVO4 |
|
Molecular Weight |
323.92 |
|
Appearance |
Yellowish solid |
|
Melting Point |
N/A |
|
Density |
6.1 g/cm3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Bismuth Vanadate Sputtering Targets Application
Bismuth Vanadate Sputtering Target is suitable for applications in areas such as solar energy conversion and photocatalysis.
Bismuth Vanadate Sputtering Targets Packaging
Our Bismuth Vanadate Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.