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Sputtering Targets

Different Shapes of Sputtering Targets

(주)연진에스텍은 Planar (Flat) TargetRotary (Cylindrical) Target, Circular (Disc)TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 특이한 요청 시 타겟 크기의 커스터마이즈가 가능합니다.

 

Key Features

  • High Purity & Performance: 일관된 증착 품질과 오염을 줄이도록 가공합니다.
  • Material Variety: 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
  • Custom Manufacturing: 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
  • Precision Design: 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
  • Flexible Supply Chain: 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.

 


CARBIDE TARGET

Carbon Sputtering Target, C Target

 

Sputtering Target

Description

 

The carbon sputtering target inherits the properties of carbon, a versatile element known for its high thermal conductivity, electrical conductivity, and chemical stability. With its hexagonal crystal structure, carbon exhibits unique properties, including:

 

  • Durability and thermal resistance.
  • Low electrical resistivity, ideal for electronic applications.
  • Lustrous black appearance and excellent lubricity.

 

 

Carbon, symbolized as “C,” is a tetravalent non-metal with atomic number 6, occurring in various allotropes such as graphite, diamond, and amorphous carbon. SAM’s carbon sputtering targets are engineered for use in high-precision thin film deposition processes.

 

 

Carbon Sputtering Target Specification

Material Type

Carbon

Symbol

C

Color/Appearance

Black solid

Melting Point

3652–3697 °C

Boiling Point

4200 °C

Density

2.267 g/cm³

Thermal Conductivity

80–240 W/m.K

Coefficient of Expansion

7.1 x 10⁻⁶/K

Available Sizes

Dia.: 1.0″–14.0″, Thick: 0.125″, 0.250″

Bonding Options

Indium bonding available

 

 

Standard Dimensions and Customization Options

Shape

Diameter/Dimensions

Thickness

Customization

Circular Targets

1.0″–14.0″

0.125″, 0.250″

Available

Block Targets

Length ≤ 32″, Width ≤ 12″

Thickness ≥ 1 mm

Available

 

 

Carbon Sputtering Target Application

Carbon sputtering targets are essential in thin film deposition for a wide range of industries, including:

 

  • Semiconductors: As coatings for advanced electronic components.
  • Displays and LEDs: Thin film layers for flat panel displays and LED devices.
  • Optoelectronics: Coatings for lenses, filters, and optical devices.
  • Energy Storage: Thin films for fuel cells and battery technologies.
  • Decorative Coatings: Enhancing surface appearance and durability.

 

Additionally, carbon is used in nuclear applications as a neutron moderator and in steel manufacturing as an alloying element.

 

Packing

Our C sputter target products are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

 

 

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