Indium Molybdenum Oxide Sputtering Target Description Indium molybdenum oxide sputtering target is composed of indium oxide and molybdenum with the chemical formula of In2O3/Mo or IMO. The composition ratio is 98 wt% and 2 wt%, respectively. High-purity indium molybdenum oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Indium Molybdenum Oxide Sputtering Target Specification Material Type Indium Molybdenum Oxide Symbol In2O3/Mo, IMO Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Indium Molybdenum Oxide Sputtering Target Application The indium molybdenum oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Indium Molybdenum Oxide Sputtering Target Packaging Our indium molybdenum oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lanthanum Barium Manganate Sputtering Target Description Lanthanum barium manganate sputtering target is composed of lanthanum, barium, manganese, and oxygen. High-purity lanthanum barium manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Barium Manganate Sputtering Target Specification Material Type Lanthanum Barium Manganate Symbol La(1-x)BaxMnO3, LBM Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Barium Manganate Sputtering Target Application The lanthanum barium manganate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Barium Manganate Sputtering Target Packing Our lanthanum barium manganate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Lanthanum Copper Manganate Sputtering Target Description Lanthanum copper manganate sputtering target is composed of lanthanum, copper, manganese and oxygen with the chemical formula La2CuMnO6. High-purity lanthanum copper manganate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Copper Manganate Sputtering Target Specification Material Type Lanthanum Copper Manganate Symbol La2CuMnO6 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Copper Manganate Sputtering Target Application The lanthanum copper manganate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Copper Manganate Sputtering Target Packing Our lanthanum copper manganate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Lanthanum Copper Oxide Sputtering Target Description Lanthanum copper oxide sputtering target is composed of lanthanum, copper, and oxygen with the chemical formula La2CuO4. High-purity lanthanum copper oxide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Copper Oxide Sputtering Target Specification Material Type Lanthanum Copper Oxide Symbol La2CuO4 Color/Appearance Solid Melting Point N/A Density 6.93 ~ 7.08 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Copper Oxide Sputtering Target Application The lanthanum copper oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Copper Oxide Sputtering Target Bonding Services Target Bonding Service is available for lanthanum copper oxide sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Lanthanum Copper Oxide Sputtering Target Packaging Our lanthanum copper oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lanthanum Ferrite Sputtering Target Description Lanthanum ferrite sputtering target is composed of lanthanum, iron, and oxygen with the chemical formula LaFeO3. High-purity lanthanum ferrite sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Ferrite Sputtering Target Specification Material Type Lanthanum Ferrite Symbol LaFeO3 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Ferrite Sputtering Target Application The lanthanum ferrite sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Ferrite Sputtering Target Bonding Services Target Bonding Service is available for lanthanum ferrite sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Lanthanum Ferrite Sputtering Target Packaging Our lanthanum ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lanthanum Gallate Sputtering Target Description The lanthanum gallate sputtering target is composed of lanthanum, gallium, and oxygen with the chemical formula LaGaO3. High-purity LaGaO3 sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Gallate Sputtering Target Specification Material Type Lanthanum Gallate Symbol LaGaO3 Color/Appearance Solid Melting Point N/A Density 6.93 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Gallate Sputtering Target Application The lanthanum gallate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Gallate Sputtering Target Packaging Our lanthanum gallate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lanthanum Lithium Titanate Sputtering Target Description The lanthanum lithium titanate sputtering target is composed of lanthanum, lithium, titanium, and oxygen with the chemical formula La(1-x) LixTiO3. High-purity lanthanum lithium titanate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Lithium Titanate Sputtering Target Specification Material Type Lanthanum Lithium Titanate Symbol LaGaO3 Color/Appearance Gray Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Lithium Titanate Sputtering Target Application The lanthanum lithium titanate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Lithium Titanate Sputtering Target Packaging Our lanthanum lithium titanate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lanthanum Scandium Oxide Sputtering Target Description The lanthanum scandium oxide sputtering target is composed of lanthanum, scandium, and oxygen with the chemical formula LaScO3. High-purity LaScO3 sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Scandium Oxide Sputtering Target Specification Material Type Lanthanum Scandium Oxide Symbol LaScO3 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Scandium Oxide Sputtering Target Application The lanthanum scandium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Scandium Oxide Sputtering Target Packaging Our lanthanum scandium oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Lanthanum Strontium Chromate Sputtering Target Description #The lanthanum strontium chromate sputtering target is composed of lanthanum, scandium, chromium, and oxygen with the chemical formula La(1-x)SrxCrO3. High-purity La(1-x)SrxCrO3 sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Lanthanum Strontium Chromate Sputtering Target Specification Material Type Lanthanum Strontium Chromate Symbol La(1-x)SrxCrO3 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Lanthanum Strontium Chromate Sputtering Target Application The lanthanum scandium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Lanthanum Strontium Chromate Sputtering Target Packaging Our lanthanum scandium oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.