Bismuth Lutetium Iron Gallate Sputtering Target Description Bismuth lutetium iron gallate is a sputtering target with the chemical formula of Bi1.5Lu1.5Fe4GaO12. High-purity bismuth lutetium iron gallate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Bismuth Lutetium Iron Gallate Sputtering Target Specification Material Type Bismuth lutetium iron gallate Symbol Bi1.5Lu1.5Fe4GaO12 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Bismuth Lutetium Iron Gallate Sputtering Target Packaging Our bismuth lutetium iron gallate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Bismuth Manganate Sputtering Target Description Bismuth manganate sputtering target is composed of bismuth, manganese, and oxide with the chemical formula of Bi2.4MnO3. High-purity bismuth manganate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Bismuth Manganate Sputtering Target Specification Material Type Bismuth manganate Symbol Bi2.4MnO3 Color/Appearance Black solid PH 6.5 Density 7.0 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Bismuth Manganate Sputtering Target Packaging Our bismuth manganate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Cerium Bismuth Ferrite Sputtering Target Description Cerium bismuth ferrite sputtering target is composed of bismuth, calcium, iron, and oxide with the chemical formula of Ce2.2Bi0.8Fe5O12. High-purity cerium bismuth ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Cerium Bismuth Ferrite Sputtering Target Specification Material Type Cerium bismuth ferrite Symbol Ce2.2Bi0.8Fe5O12 Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Cerium Bismuth Ferrite Sputtering Target Packaging Our cerium bismuth ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Cerium Yttrium Ferrite Sputtering Target Description Cerium yttrium ferrite sputtering target is composed of cerium, yttrium, iron, and oxide with the chemical formula of Ce2.5Y0.5Fe5O12. High-purity cerium yttrium ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Cerium Yttrium Ferrite Sputtering Target Specification Material Type Cerium Yttrium Ferrite Symbol Ce2.5Y0.5Fe5O12 Color/Appearance Gray solid PH N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Cerium Yttrium Ferrite Sputtering Target Packaging Our cerium yttrium ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition. Cerium Yttrium Ferrite Sputtering Target Application Cerium yttrium ferrite sputtering materials are used for thin-film coating applications, CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Cobalt Ferrite Sputtering Target Description Cobalt ferrite sputtering target is composed of cobalt, iron and oxide with the chemical formula of CoFe2O4. High-purity cobalt ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Cobalt Ferrite Sputtering Target Specification Material Type Cobalt Ferrite Symbol CoFe2O4 Color/Appearance Gray to black solid PH N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Target Bonding of Cobalt Ferrite Sputtering Target Indium Bonding and Elastomeric Target Bonding Services are available for cobalt ferrite sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. Packaging of Cobalt Ferrite Sputtering Target Our cobalt ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Europium Nickel Oxide Sputtering Target Description Europium nickel oxide sputtering target is composed of rare earth europium, nickle and oxide with the chemical formula of EuNiO3. High-purity europium nickel oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Europium Nickel Oxide Sputtering Target Specification Material Type Europium Nickel Oxide Symbol EuNiO3 Color/Appearance Solid Structure N/A Density 7.57 g/cm3 Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Packaging of Europium Nickel Oxide Sputtering Target Our europium nickel oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Europium Titanate Sputtering Target Description Europium titanate sputtering target is composed of rare earth europium, titanium and oxide with the chemical formula of EuTiO3 or ETO. High-purity europium titanate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Europium Titanate Sputtering Target Specification Material Type Europium Titanate Symbol EuTiO3 or ETO Color/Appearance Black Solid CAS Number 12020-61-0 Structure Perovskite Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Europium Titanate Sputtering Target Application The europium titanate sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Europium Titanate Sputtering Target Packaging Our europium titanate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Indium Aluminum Zinc Oxide Sputtering Target Description Indium aluminum zinc oxide sputtering target is composed of indium oxide, aluminum oxide and zinc oxide with the chemical formula of In2O3/Al2O3/ZnO. The composition ratio is 65 wt%, 16 wt% and 19 wt%, respectively. High-purity indium aluminum zinc oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Indium Aluminum Zinc Oxide Sputtering Target Specification Material Type Indium Aluminum Zinc Oxide Symbol In2O3/Al2O3/ZnO Color/Appearance Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Indium Aluminum Zinc Oxide Sputtering Target Application The indium aluminum zinc oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Indium Aluminum Zinc Oxide Sputtering Target Packaging Our indium aluminum zinc oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Indium Iron Oxide Sputtering Target Description Indium iron oxide sputtering target is composed of indium, iron and oxide with the chemical formula of InFe2O4. High-purity indium iron oxide sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability. Indium Iron Oxide Sputtering Target Specification Material Type Indium Iron Oxide Symbol InFe2O4 Color/Appearance Reddish Solid Melting Point N/A Density N/A Type of Bond Elastomer, Indium Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ Other sizes are also available. Please contact us for customized sputtering targets. Indium Iron Oxide Sputtering Target Application The indium iron oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc. Packaging of Indium Iron Oxide Sputtering Target Our indium iron oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.