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MBE, Molecular Beam Epitaxy System

Dr. Eberl MBE-Komponenten GmbH, Germany

Trusted expertise since 1990

35 years of development and manufacture of complex systems and components for multiple tasks

Roll-to-Roll Systems

Information on the angular flux distribution, resulting flow rate distribution, material composition on the substrate, and material efficiency: optimization of the system design.

 


Schematic illustration of the deposition process with 3 pairs of point sources depositing materials onto a moving roll.

  • Why MC-Simulation?
    It provides important information while saving time and money

  • MC-Simulation allows the optimization of

    • source design
    • source arrangement
    • deposition chamber layout
  • It provides information about

    • layer uniformity
    • material efficiency
    • layer composition
  • For single material deposition and co-evaporation

Monte Carlo simulation allows to calculate the flux distribution of various types of evaporation sources. It provides information on resulting flow rate distribution, material composition on the substrate, and material efficiency, thus allowing to optimize source design, source arrangement and depositon system layout.

The figure above shows a source arrangement in a roll to roll deposition process. Important model key parameters for the calculations are:

  • cell-substrate distance
  • cell-cell distance
  • cell tilt
  • beam shaping insert (nozzle) geometry
Normalized film thickness profile (lower part) and 2D flux distribution (upper part) for an optimized cell to cell distance dcc shown in thecenter

 

This profile is integrated along the band direction and results in a line profile across the band. The change of the thickness profile and the flux distribution for reduced and for increased cell to cell distance is illustrated in the left and in the right part, respectively. A precise and carefully adjusted arrangement of the deposition setup is necessary to achieve extraordinary film thickness uniformity.

A too small cell to cell distance results in a pronounced maximum thickness in the center of the band.  A very large cell to cell distance results in a minimum in the center of the band.

Our proprietary deposition simulation tool provides

  • film thickness variations and composition
  • material efficiency
  • deposition chamber design optimization
  • optimization of beam shaping elements

We offer the deposition simulation for your MBE or PVD system as a service. For a specific simulation geometrical boundary conditions of the deposition setup are required.

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Equipment Rotary Pneumatic Module RPM Rotary Pneumatic Module RPM The RPM is a drive unit for rotary shutter motion. Its torque reaches 0.
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Equipment Shutter Shutter We provide a variety of cell shutters designed for different evaporation sources. The shutte
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Equipment Shutter Control Unit SCU Shutter Control Unit SCU The SCU is the power supply and controller for different soft-acting shutte
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Equipment Soft-acting Linear Shutter Module LSM Soft-acting Linear Shutter Module LSM The LSM consists of a soft-acting linear motion mechanism, dri
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Equipment Soft-acting Rotary Shutter Module RSM Soft-acting Rotary Shutter Module RSM The RSM is a drive unit for rotary shutter motion that provide
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Equipment Viewport Shutter FSH Viewport Shutter FSH The Viewport Shutters FSH are high-quality swing shutters used to cover and pro
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Simulation and Consulting Roll-to-Roll Systems Information on the angular flux distribution, resulting flow rate distribution, material composition
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