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Surface Techniques

Adhesion Testing Equipment, Patterning and Surface Texturing System, Plasma Surface Treatment System

ATC-T SERIES THERMAL EVAPORATION SYSTEMS

ATC-T Series Thermal Evaporation System은 최적의 성능을 제공하고 최고 품질의 구성 요소를 활용하면서 탁월한 가치를 제시하는 박막 증착 장비입니다. 본 제품은 원통형 (UHV) 및 박스 스타일 (HV) 구성으로 제공됩니다. AJA International의 이러한 시스템은 고도로 진화된 ATC 및 ATC Orion 스퍼터링 장비의 수 많은 디자인 특징과 공통적인 부품을 계승하며 AJA International의 고유한 300 Amp, 수냉식 열 증발 소스, Knudsen 셀, 유기 재료 용 저온 증발 셀 및 Luxel Radak을 장착 할 수 있습니다. 더욱이. 이러한 장비에는 AJA 마그네트론 스퍼터 소스, 로드 락 (load lock), QCM 모니터링 및 제어, 가열 또는 냉각 기판 홀더, planetary, 다양한 펌핑 패키지 및 자동 제어가 포함될 수 있습니다.

 

TYPICAL THERMAL EVAPORATION SYSTEM CONFIGURATIONS

ATC Orion 5-T

ATC Orion 5-T 모델은 850°C 기판 히터 (substrate heater)를 장착한 세 개의 AJA thermal source 가 특징입니다.

ATC Orion 5-T
Featuring (3) AJA thermal sources with and an 850°C substrate heater.

 

ATC Orion 8-T

ATC Orion 8-T 모델에는 세 개의 Luxel Radak 가열로와 850°C 기판 히터 (substrate heater), 터보 펌프 식 진공 로드 락 (turbo-pumped vacuum load-lock)이 장착되어 있습니다.

ATC Orion 8-T
Fitted with (3) Luxel Radak furnaces, and 850°C substrate heater and a turbo-pumped vacuum load-lock.


ATC 1800 T

ATC 1800 T 모델은 최대 4 개의 Radak Furnace 및 4cm K&R 격자 형 이온 소스 (gridded ion source)를 수용하여 사전 세척 (pre-cleaning) 및 이온 열 증착 (ion assisted thermal deposition)을 수행합니다. 소스에는 제어된 co-deposition이 가능하도록  개별적 QCM 절연 튜브 (isolation tube)와 850°C 기판 히터 (substrate heater)가 포함됩니다.

ATC 1800 T UHV
Accommodates up to (4) Radak Furnaces and a 4cm K&R gridded ion source for pre-cleaning and ion assisted thermal deposition.  The sources include individual QCM isolation tubes to allow controlled co-deposition and an 850°C substrate heater.


ATC 2200-T UHV

로드 락 (load lock)을 갖춘 다목적 ATC 2200-T UHV 모델은 편리한 슬라이드 메커니즘에 6 개의 Radak Evaporation Furnace 또는 6 개의 Pocket Linear E Beam Source를 수용 할 수 있습니다. 또한 co-deposition을 조절하도록 하는 isolation tube가 있는 6개의 QCM 헤드가 있습니다. 그리드 형 이온 소스와 다양한 thermal source도 제공됩니다.

ATC 2200-T UHV with Load-Lock
This versatile UHV tool can accommodate either 6 Radak Evaporation Furnaces or a 6 Pocket Linear E Beam Source on a convenient slide mechanism.  It also features (6) QCM heads with isolation tubes for controlled co-deposition.  A gridded ion source and numerous thermal sources are also offered.

 

ATC 2030-T

ATC 2030-T Box Coater는 액체질소 기판 냉각 기능과 4개의 AJA 300A thermal source, 터보 펌프 진공 로드 락을 갖춘 thermal box coater입니다,

ATC 2030-T Box Coater
Thermal box coater with LN2 substrate cooling, (4) AJA 300A thermal sources and a turbopumped vacuum load-lock..
TYPICAL RATE / UNIFORMITY DATA​​​
The actual data shown at the left was taken from the ATC 1800-T
shown above with (4) Radak II Furnaces.  
The uniformity achieved over a 100 mm diameter wafer is ±2%.  
In this system any of the (4) Radak sources can achieve
this uniformity when operated independently or when operated
simultaneously in a controllable co-deposition experiment.  

 

TYPICAL RATE / UNIFORMITY DATA

ATC-T Series Thermal Evaporation System은 빠르고 낮은 가열속도 용으로 구성할 수 있습니다. 제어된 co-deposition도 전문성을 갖습니다. 적절한 기판 fixturing과 motion이 균일성(uniformity)을 최적화하는 데 이상적입니다.

본 데이터는 4개의 Radak II Furnace와 함께 ATC 1800-T로부터 취해진 것입니다. 직경 100mm 웨이퍼에서 달성된 균일성은 ±2%입니다.
이 시스템에서 4개의 Radak 소스는 독립적으로 작동하거나 제어 가능한 co-deposition 실험에서 동시에 작동 할 때 이러한 균일성(uniformity)을 얻을 수 있습니다.


EVAPORATION SOURCES

AJA’s offers a variety of evaporation sources on the ATC-T, ATC Orion-T and ATC 2030/36-T deposition systems. The vertical cylinder chambers are best suited to linear, multi-pocket, UHV, e-beam sources which are side mounted and attached to a convenient slide rail for service and loading access. Spare ports on the chamber bottom straddling the linear e-beam source allow for the addition of up to 4 thermal evaporation sources. Smaller ATC Orion-TE chambers are ideally suited to multiple, small, thermal evaporation sources (k-cell, resistive boat, Radak, low temp organic) often in combination with magnetron sputter sources. The ATC 2030/36-E HV box coaters with large loading doors are generally fitted with rotary pocket e-beam sources, resistive thermal sources and substrate carriers of all forms - heated, cooled, tilting, planetary, wedge shuttered, etc.

 (2) AJA Thermal Evaporation Sources with water 
 cooled feedthroughs, shutter  assemblies,  and (2)  ​​​​in-situ
material refill  systems for  replenishing boats
without breaking vacuum.
(6) Pocket Linear E-Beam Source 
with (4) isolated and shuttered AJA thermal evaporation sources.

 

 

 

 

 


 

 

 

Mini Thermal Evaporator Retrofit Flange
This retrofit flange can be employed on shorter chambers
and features a water cooled base flange for thermal
boats in close proximity.  It is ideal for small substrates
and is offered with a high current power supply with
a (3) way switchbox. 
Retractable Linear Slide
 Accommodates up to 6 Radak sources with  individual
shutters and isolation shielding.  
This  design is excellent for source refilling, crucible  
exchange and maintenance.

 

 

 

 

 

 

 

 

 

Source Shutter and Isolation (internal view)
Also visible is a gridded ion source and an opening
in the center of the shielding for an optical pyrometer
pointed directly at the center of the substrate.
Evaporation Well for ATC Orion Chambers
 This Evaporation well mounts to the bottom of  
standard ATC Orion chambers and features (3)  
isolated and shuttered Radak II evaporation  furnaces.
The well helps increase the working  distance in shorter
multi-use chambers to optimize  uniformity.

 

 

 

 

 

 

 

 

 

SUBSTRATE HOLDERS - HEATING / COOLING

AJA is able to fit your customized evaporation system with a wide variety of substrate holders.  These include motorized, rotating substrate holders and planetaries to achieve excellent uniformity, heating up to 1000°C, substrate RF and DC biasing, in-situ manual or motorized Z motion (for working distance adjustment and load-lock transfer) and in-situ mask exchange (available only with certain configurations). Cooled substrate carriers ( H2O/ LN2) are also available depending on the application requirements. Process gas ring or gas distributor options are offered for reactive processing or applications requiring an anneal step.

850°C Heater with QCM Isolation tubes
 When controlled thermal co-deposition is desired,  
individual isolated QCM's are required.  AJA has  
optimized software to make this reliable and  consistent.
800°C 6" Heater with QCM Isolation tubes 
In this picture, a larger version of the substrate heater
on the left is shown with as many as 6 QCM isolation ​​​​​tubes.

 


 

 

 

 

 

 

 

6” LN2 Cooled Substrate Holder 
 with rotation and Z-motion
4” SiC 1000°C Substrate Heater 
with a water-cooled wedge type shutter for high temp.
gradient films, and secondary “swing in” LN2 cooled
substrate holder.

 

 


 

 

 

 

 

 6” Water Cooled Substrate Holder 
 front side radiant heating
Planetary Substrate Holder 
capable of accommodating (4) 4” wafers

 

 

 

 

 

 

 

Glancing Angle Deposition (GLAD) 4” Substrate  Holder 
with 800°C heating, rotation, and +/- 180°  tilting
Glancing Angle Deposition (GLAD) 6" Substrate Holder 
with water cooling, rotation, and +/- 180° tilting

 


 

 

 

 

 

PHASE II-E COMPUTER CONTROL

The AJA Labview based Phase II-E computer control system is offered on all ATC-E Series Evaporation Systems. This straightforward, user friendly control system utilizes a large, flat-screen laptop in a 19” rack drawer connected to a single 7” high x 19” wide rack mount hardware module. The back panel of the hardware module is populated with connectors to interface to all aspects of the sputtering system.

The Phase II-E control system allows the user to operate in either the “manual mode” or the “automated processing mode.” In the “automated processing mode”. the user designs process “layers” which are then compiled and saved as a “process”. The system allows 10 unique user entry points which are accessible only by password, limiting access to a user’s layers and preventing unexpected corruption of a user’s saved processes.

The standard Phase II-E control system will accommodate up to (2) e-beam sources, (4) thermal sources, (1) ion source or (1) RF bias supply, (3) process gases, (2) thickness monitors, (6) shutters, closed loop automatic pressure control if required and substrate temperature control and motion. Processes are aborted if proper feedback is not detected. Special “soak layers” can be easily incorporated into the process. Finally, data logging is standard with an adjustable refresh period. Process data can be downloaded to common spreadsheet programs. The Phase II E is often linked directly to a deposition controller with multiple QCM heads.

Labview Computer Control
 Large screen laptop on convenient slide drawer
 for Labview based ATC system computer control.  
Replacement laptops are always in stock at AJA.
Computer Control Module Phase II E PLC
Phase II E PLC in compact 4U rack mount case.
This module is fitted from the outset with all receptacles
for quick field retrofits/upgrades.

 


 

 

 

 

 

 

 

INFICON SQC310

  INFICON SQC310


For many e-beam system application, AJA uses the INFICON SQC310 Series deposition controller.   The SQC310 is fully interfaced to control electron beam source indexing, shutter control, and both single and co-evaporation (SQC-310-C) processes.  A large on board storage capacity of 100 individual processes and 1,000 layers, enables easy access to recall processes and parameters for sample repeatability. The controller package also includes a Windows program for developing, testing, and downloading processes, and for logging instrument data to a customer’s PC if desired for process analysis and quality control.

 

 

 

SYSTEM OPTIONS

 Positionable QCM
RF/DC Ion Source

 

 

 

 

 

 

 

Thermal Evaporation Options
Load-Locks with In-Situ Contact Mask Exchange

 

 

 

 

 

 

 

 Labview based Computer Control on convenient  
slide drawer
Power Distribution Modules for 208V and 
 380V systems

 

 

 

 

 

 

 

 Turbomolecular Vacuum Pumps
 Cryogenic Vacuum Pumps with Automated 
 Pump Control

 

 

 

 

 

 

 

 Cassette Load-Locks for 75 mm Ø to 200 
 Ø mm substrates 
Evaporation Materials

 


 

 

 

 

 

 

 

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